等离子体激励器对气膜冷却效率的影响

基金项目:

国家自然科学基金

详细信息

Numerical simulation of film cooling effectiveness with plasma actuator

摘要: 建立了介质阻挡放电等离子体激励模型,模拟了在等离子体激励作用下的平板气膜冷却过程,研究了不同吹风比条件下等离子体激励器的激励和结构参数对气膜冷却效率的影响。结果表明:激励电压越高、电极弧度越大、电极厚度越薄、绝缘材料介电常数越大及绝缘材料厚度越薄,等离子体激励的诱导能力越强,能够改善气膜的贴壁特性,提高冷却效率;激励器激励频率对冷却效率的影响很小。激励器参数的改变不影响冷却效率随吹风比的变化特征。
- 介质阻挡放电 /
- 等离子体 /
- 气动激励 /
- 气膜冷却 /
- 冷却效率
Abstract: Dielectric barrier discharge plasma actuation model is established to simulate the flat film cooling process with plasma actuation.The influence of plasma actuation parameters and structure parameters on film cooling effectiveness is analyzed under different blowing ratios.The results show that the increase of actuation voltage,electrode radian and insulation dielectric con-stant or the decrease of electrode thickness and insulation thickness can lead to better coverage on the hot side,thus improving the film cooling effectiveness.The impact of the actuation frequency on the cooling effectiveness is small.The relationship between the cooling effectiveness and the blowing ratio is not affected by actuator parameters.